fluorocarbon thin films fabricated using carbon nanotube/polytetrafluoroethylene composite polymer targets via mid-frequency sputtering
Frequency sputtering process.
Carbon fluorine compound films deposited using carbon nanotubes/PTFE composite targets exhibit a non-crystalline phase with smooth surface and show high water contact points, optical transmission ratio and surface hardness. X-
The study of ray electron energy and Fourier transform infrared spectroscopy shows that with the increase of the concentration of carbon nanotubes in the composite target, the carbon Cross
The bonding structure is formed, thus increasing the hardness and modulus of the film of the carbon fluorine compound film. Large-
An area carbon fluorine compound film with a substrate width of 700mm was successfully prepared by pilot testscale roll-to-
A roller plating system using carbon nanotubes/PTFE composite targets.
Since the first report in 1960, the sputtering plasma polymer film using polymer targets has been widely studied and developed.
In a variety of polymer targets, polysifluoride (PTFE)
Polymer targets are mainly used for the deposition of organic films by sputtering process.
Carbon fluoride film deposited by Radiofrequency (RF)
The sputtering using a four fluorine target has many favorable surface properties, such as the hydrophobic and super-
Hydrophobic, transparent, oleophobic, high transparency, dielectric and mechanical properties, and antimicrobial properties.
As a result, these films have recently attracted a lot of attention in practical applications for flat panel displays, automotive, fabric, film and high-size displays
A wide range of groups have studied the thin films of carbon-fluorine compounds.
Bidman group has made great contributions to the development of RF technology
Plasma polymer thin film.
They reported that various types of polymer targets were sprayed under various gas conditions to form an ultra-
Nano-composite film of hydrophobic.
Faupel group focuses on the nano-composite film formed by metal methodpolymer co-
Sputtering and multi-layer process.
Iwamori group reports many research results focusing on the optical and mechanical properties of RF-
Film of carbon fluorine compound.
RF sputtering is widely used when the film is deposited using insulating materials, but this method is costly, low productivity, and is applied to large-area substrate.
By means of the sputtering method, the insulating film is deposited by the reaction of the conductive target rather than by radio frequency sputtering.
MF sputtering systems typically use a frequency generator of 20 to 80 khz, which reduces signal reflection without an additional matching box and improves the sputtering efficiency during the reactive sputtering process.
With these advantages, many volumesto-
The roll plating system is used to produce flexible thin film devices by MF sputtering process.
Most polymer targets, however, are
It is difficult to apply to conductive materials of MF sputtering, for this reason, most of the reported experiments were carried out by depositing plasma polymer films using RF sputtering methods.
In this study, we have prepared carbon nanotubes (CNT)
By using MF sputtering with a composite target, the conductivity is passed to the polymer target and carbon fluorine compound films are deposited.
By determining the structure, surface and optical properties of the film, the effect of CNT in the composite target on the properties of the carbon fluorine compound film was studied.
In addition, we can make a large
The area of the CNT/fe composite target on pet carbon fluorine compound film (PET)
Substrate using rolls-to-
Roller plating system with 700-
Substrate width mm.